Influence of Gallium Doping on the Electrical Performance of P3HT Thin-film Transistors Enriched by ZnO Nanoparticles
Abstract
Abstract: In the present work, p-type organic field-effect transistors based on poly (3-hexylthiophene) (P3HT) enriched by gallium doped-zinc oxide (GZO) nanoparticle thin films as the active layer were fabricated using the sol-gel technique coupled with spin-coating method and characterized using various techniques. The morphology of the thin films was analyzed using atomic force microscopy (AFM) and scanning electron microscopy (SEM) techniques, and their optical properties were investigated using the UV-Vis-IR spectroscopy technique. In order to investigate the effect of Ga doping concentration on the electrical performances of the organic thin-film transistors (OTFTs) based on P3HT:GZO thin films, the current-voltage (I-V) measurements were carried out in the dark and in daylight using a Keithley 2612B Source Meter. The results demonstrate the ability to control both threshold voltage (Vth) and hysteresis by adjusting the Ga doping concentration within the active layer of the transistor devices. Moreover, the fabricated OTFT-P3HT:GZO devices exhibited significantly high performance, achieving a current ratio (Ion/Ioff) of 3.5 × 10³ with 1% Ga loading and demonstrating a 100-fold enhancement in field-effect saturation mobility (μsat) with 3% Ga loading, thereby showcasing their promising potential in a variety of practical applications, including cost-effective photodetectors and sensors.
Keywords: ZnO:Ga nanoparticles, P-type OTFT-P3HT:GZO, Gallium loading effect, Electrical properties, OTFT device performance.