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Alsheikhjader MSH, Issa AA. A Simulated 45 nm MOSFET Channel Process in Transimpedance Amplifier Design for Optoelectronics Applications. JJP [Internet]. 2024 Jul. 28 [cited 2024 Dec. 14];17(2):165-78. Available from: https://jjp.yu.edu.jo/index.php/jjp/article/view/328