Mini A, Karman MB, Daoun R. Influence of Ar:O2 Mixing Ratio on Characteristics of Tio2 Nanostructured Thin Films Deposited by DC Reactive Magnetron Sputtering Method. JJP [Internet]. 2024 Apr. 15 [cited 2024 Nov. 21];17(1):59-73. Available from: https://jjp.yu.edu.jo/index.php/jjp/article/view/228