MINI, A.; KARMAN, M. B.; DAOUN, R. Influence of Ar:O2 Mixing Ratio on Characteristics of Tio2 Nanostructured Thin Films Deposited by DC Reactive Magnetron Sputtering Method. Jordan Journal of Physics , [S. l.], v. 17, n. 1, p. 59–73, 2024. Disponível em: https://jjp.yu.edu.jo/index.php/jjp/article/view/228. Acesso em: 21 nov. 2024.