Plasma Characterization in Planar Magnetron Sputtering Systems Using Optical Emission Spectroscopy and Langmuir Probe Diagnostics
Keywords:
Glow discharge, Optical emission spectroscopy, Langmuir probe, I-V curve, Plasma parameters, Beta valueAbstract
Abstract: This study experimentally investigates the fundamental characteristics of glow discharge plasma, including electron temperature, electron density, and plasma potential, which are crucial for optimizing sputtering operations. Optical emission spectroscopy (OES) was utilized to examine spectral lines produced by the plasma, offering a direct assessment of the electron energy distribution. The integration of various diagnostic techniques provides a precise and reliable evaluation of plasma characteristics, enhancing sputtering performance and improving control and efficiency in thin-film deposition. Our findings underscore the synergy between OES and Langmuir probe diagnostics in plasma analysis, while the planar magnetron demonstrates effectiveness in monitoring and optimizing sputtering operations. Furthermore, our findings indicate a significant relationship between gas pressure and the characteristics of glow discharge plasma. Lower pressures facilitate electron transport and increase the plasma potential gradient, whereas higher pressures promote a stable and spatially uniform plasma distribution.
Keywords: Glow discharge, Optical emission spectroscopy, Langmuir probe, I-V curve, Plasma parameters, Beta value.
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